Use：Etching is widely used in integrated circuit, fluorescence display screen, exact filtration, microelectrode etc.
Technique Advantage:
The technique improved traditional metal processing method.
The technique could process concavo-convex metal products via data, charts and graphs, design and complicated histogram etc.
The technique could be used to produce various kinds of hole and shape.
Technique Standard
Minimum Wire Dia.: 0.02mm
Maximize Production Area: 500mm*600mm
Material Thickness: 0.02mm - 0.5mm
